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1D stack scaning electron micrograph (SEM).
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For the stop band starting at 1.7µm it was found that
the appropriate thicknesses are 170nm and 390nm for Si
and SiO2, respectively. The preliminary
design simulations for a ten layer filter showed a stop
band from 1.75µm to 3.2µm.
Initially, a stack was fabricated
using the e-beam evaporation technique, within MIT’s
Technology Research Laboratory. It was concluded that
the layer uniformity and thickness precision produced
by this technique were not satisfactory. A different
approach at producing the filter using low pressure
chemical vapor deposition (LPCVD) techniques yielded
significantly improved fabrication results.
A broadband spectrophotometer
was used to characterize the filters’ spectral performance. The
optical properties of the deposited materials were evaluated
using a spectroscopic ellipsometer. Effective filter fabrication
is a complex and iterative process requiring careful
experimental validation of theoretical predictions, and
evaluation of various techniques with a view to identifying the
optimal technique, in terms of cost, complexity and, of course,
product quality.
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